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manufacturer supply High purity 99.95% Co Ta Zr target Cobalt Tantalum Zirconium Sputtering Target
manufacturer supply High purity 99.95% CoTa Zr target Cobalt Tantalum Zirconium Sputtering Target
Cobalt Tantalum Zirconium Sputtering Target of Product Description
|
Item Name |
High purity materials 99.99% Tantalum sputtering target |
|
Purity |
99.99% |
|
Shape |
Flat/rotary target, according to your request |
|
Available size |
Round: dia 25~300mm,Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available |
|
Certificates |
ISO9001:2008, SGS,The third test report |
|
Technics |
Hot Isostatic Pressing (HIP) |
|
Application |
Widely used in coating processing industries A: Magnetic Data Storage Application B: Electronic and Semiconductor Application. C: Decoration and Coating Applicatio |
Cobalt Tantalum Zirconium Sputtering Target of Quality Standard
|
Quality Standard (99.99% Ta) |
|||||
|
Element |
Value(≤Ppm) |
Element |
Value(≤Ppm) |
Element |
Value(≤Ppm) |
|
Nb |
3 |
Ni |
0.5 |
Ti |
0. 5 |
|
O |
10 |
Zr |
1 |
Mn |
0. 5 |
|
N |
3 |
Cr |
0. 5 |
Al |
0. 5 |
|
C |
5 |
W |
1 |
H |
2 |
|
Si |
0. 5 |
Mo |
1 |
|
|
|
Fe |
2 |
Cu |
0. 5 |
|
|
Cobalt Tantalum Zirconium Sputtering Target of Products Show
