99.95% High Purity Niobium Rotating Sputtering Target for coating film

99.95% High Purity Niobium Rotating Sputtering Target for coating film

99.95% High Puiry Niobium Rotating Sputtering Target for coating film

 Niobium Rotating Sputtering Target of Specification

 Product name

 Niobium Rotating Sputtering Target

 Material

 Pure Niobium 

 Grade

 Nb1 Nb2

 Purity

 99.95%Min

 Shape

 Round rectangle square

Weight

 335kg

 Density

 8.57g/cm3

 Composition

 Nb ,N ,H ,O ,C

 Surface

 bright and smooth

 Specifications

 OD:70mm ; Thickness:7mm ; ID:56mm ; Length :200mm – 600mm

 Standard

 ASTM B394-98

Pressing Method

 Forging

 Application

 Industry aerpospace sputtering electronic

 

  Niobium Rotating Sputtering Target of Component

Element

Fe

Si

Ta

Cr

H

N

O

Standard

0.005

0.005

0.1

0.002

0.001

0.015

0.015

Measured value

0.0015

0.004

0.03

<0.0005

0.0003

0.002

0.005

Element

Ni

Mo

W

Ti

C

Zr

 /

Standard

0.005

0.01

0.03

0.002

0.01

0.02

 /

Measured value

<0.0005

<0.001

<0.003

<0.001

0.001

0.002

        /

   Niobium Rotating Sputtering Target of feature

      1.high melting point

  2.corrosion resistance

  3.good cold work ability characteristics

   Niobium Rotating Sputtering Target of Application

  1. chemical industry, electronic industry, aviation and aerospace industry,

  2. mainly for the production of high-pressure sodium lamp, aviation and aerospace engine structural materials, chemical reaction container, a heat exchanger tube, reactor internal components and package materials

  If you are interested in any of our products, please feel free to visit our website and contact us directly for more informations. We are looking forward to cooperate with you!

 

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