High purity Zirconium sputtering target, Zr sputtering targets

High purity Zirconium sputtering target, Zr sputtering targets

 https://www.matmetals.com/product/precious-metal-sheet

High purity Zirconium sputtering target, Zr sputtering targets

 

We are professional factory to produce all kinds of materials Disc/Planar/Rotary sputtering target. Ti sputtering target, Zr sputtering target, Cr sputtering target, Ni sputtering target, Cu sputtering target, Mo sputtering target, W sputtering target, Nb sputtering target, Ta sputtering target, V sputtering target, Al-Ti sputtering target, Ni-Cr sputtering target, Nb-Zr sputtering target, Mo-Nb sputtering target, Al alloy sputtering target, Al-Ti- Si sputtering target, Cr-al sputtering target, Si-Ai sputtering target, Ni-V sputtering target and Ti-Zr sputtering target are all mainly products.

If there are no sputtering target you need, pls click here, We will according to your requirement to produce it.

Zr sputtering Target of Products attributes 

Item Name

High purity Zirconium sputtering target, Zr sputtering targets

Purity

99.95%

Shape

Flat/rotary target, according to your request

Available size

Round: dia 25~550mm, Thickness:3~30mm

Rectangular: Length up to 2000mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Hot isostatic pressing

Application

Widely used in coating processing industries

Decoration and mould field. etc.

Detailed information

Zirconium is rare metal with amazing corrosion resistance, high melting point, high hardness and high strength characteristics, widely used in aerospace, military project, nuclear reactions and atomic energy field.

 

 

 

High purity Zirconium sputtering target, Zr sputtering targets

 Quality Standard (99.95% Zr)

Element

Value (<ppm)

Element

Value (<ppm)

Element

Value (<ppm)

Li

0.1

Fe

5

Mn

0.1

Na

1

Hf

100

Cu

0.5

Si

1

H

1

Cd

0.5

Ca

0.5

N

2

Pb

0.1

Cr

0.5

B

0.1

Ti

2.5

Ni

0.5

Al

1

Mo

1

Nb

0.5

K

1

C

5.6

Be

0.1

V

0.1

O

14

Sn

0.1

 

 

 

 

Zirconium sputtering target Of Product Description:

metal sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photo conductive films, lubricant films, magnetic and memory elements to name but a few.

Zirconium sputtering target of Technology:

Manufacturing processes we use depend on the properties of the target material and its application. Fabrication methods vary from vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed and forged.

 

 

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