High purity 99.99% metal Tantalum Sputtering Target

  Product Description

  Item Name:Tantalum Target 99.99% Planar Target

  Purity: 99.9%

  Available size Round: dia 20~250mm

  Rectangular: length up to 1600mm

  Customization is available

  Oxygen content: low

  Certificates: ISO9001:2008, the third test report

  Technics: Powder Metallurgy

  Application :widely used in coating processing industries

  a: architectural glass, car using glass, graphic display field.

  b:electronic and semiconductor field.

  c:decoration and mould field.

d:optics coating materials

Advantage:

  High Hard texture

  Low impurity content

  Better heat dissipation

High Tensile strength

 

Item Name

Tantalum (Ta) sputtering target

Available Purity 

3N,3N5,4N

Dimension

As per your request

Available Shape

Planar, Rotary

Density

16.654g/m³

Melting point

2996℃

Boiling point

5425℃

Technology

Vacuum Melting, Patented thermo-mechanical process and machine work

Application

Semiconductors, Micro-Electronics etc.

 

 

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