Products
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JINXING METAL offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.
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- high quality 4n price niobium oxide sinter
- low price ASTM B365 UNS R05252 Tantalum rod wire
- high quality 20V 47uF Capacitor SMD Tantalum capacitor Type D
- low price 99.99% purity niobium oxide manufacturer
- 0.5mm tantalum foil for industry use
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- high quality 4n price niobium oxide sinter
- low price ASTM B365 UNS R05252 Tantalum rod wire
- high quality 20V 47uF Capacitor SMD Tantalum capacitor Type D
- low price 99.99% purity niobium oxide manufacturer
- 0.5mm tantalum foil for industry use
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- high quality 4n price niobium oxide sinter
- low price ASTM B365 UNS R05252 Tantalum rod wire
- high quality 20V 47uF Capacitor SMD Tantalum capacitor Type D
- low price 99.99% purity niobium oxide manufacturer
- 0.5mm tantalum foil for industry use
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The popular geometries of tantalum sputtering target are available with both planar sputtering targets and rotatable sputtering targets, such as tantalum circular, tantalum rectangular, tantalum ring, tantalum tube, tantalum cylinder(cylindrical targets) and tantalum conicity, etc., we can meet your unique requirements on tantalum sputtering targets no matter in density, purity, homogeneity or in geometry of the sputtering target for the thin film industry.
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- high quality 4n price niobium oxide sinter
- low price ASTM B365 UNS R05252 Tantalum rod wire
- high quality 20V 47uF Capacitor SMD Tantalum capacitor Type D
- low price 99.99% purity niobium oxide manufacturer
- 0.5mm tantalum foil for industry use
