Tantalum Sputtering target

Product Description

– CircularTantalum targets :
25mm up to 650mm Diameter x 3mm up to 25.4mm Thickness (1" to 25" diameter x 0.1181" to 1" thickness)

The material is available as follows :
– R05200, unalloyed tantalum, electron-beam furnace or vacuum-arc melt, or both,
– R05400, unalloyed tantalum, powder-metallurgy consolidation,
– R05255, tantalum alloy, 90 % tantalum, 10 % tungsten, electron-beam furnace or vacuum-arc melt, or both,
– R05252, tantalum alloy, 97.5 % tantalum, 2.5 % tungsten, electron-beam furnace or vacuum-arc melt, or both, and
– R05240, tantalum alloy, 60 % tantalum, 40 % nobium, electron-beam furnace or vacuum-arc melt.
Typical Size & Application: The popular geometries of tantalum sputtering target are available with both planar sputtering targets and rotatable sputtering targets, such as tantalum circular, tantalum rectangular, tantalum ring, tantalum tube, tantalum cylinder(cylindrical targets) and tantalum conicity, etc.,  we can meet your unique requirements on tantalum sputtering targets no matter in density, purity, homogeneity or in geometry of the sputtering target for the thin film industry.

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