Zirconium Zr Sputtering Targets

Zirconium Zr Sputtering Targets Description

Thin film deposition (coating) is the process of forming and depositing a thin film coating on a substrate material that can be used to change or improve certain elements of the properties of the substrate and is an important manufacturing step in the production of many optoelectronic, solid-state and medical devices and products. Zirconium Zr Sputtering Targets is mainly made of high purity zirconium metal after forging,

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High purity Zirconium sputtering target, Zr sputtering targets

 

Zirconium sputtering target of Product Introduction

Zirconium is a lustrous, greyish-white, soft, ductile and malleable metal that is solid at room temperature, though it is hard and brittle at lesser purities. The melting point of zirconium is 1855 °C (3371 °F), and the boiling point is 4371 °C (7900 °F). Zirconium has an electronegativity of 1.33 on the Pauling scale.

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