English
French 
German
Product Description
Tungsten Target Details
A sintered tungsten target for sputtering, characterized in that it exhibits a relative density of 99 % or more, an average crystal grain diameter of 100 μm or less, an oxygen content of 20 ppm or less and a deflection force of 500 MPa or more; and a method for preparing the tungsten target with stability at a low cost, which uses improved production conditions for a raw material tungsten powder and improved sintering conditions. The sintered tungsten target has a high level of density and a high degree of the fineness of a crystal structure which have never been achieved by a conventional pressure sintering method and is markedly improved in deflection force, which has resulted in the significant decrease in the occurrence of particle defects.
Please leave your information to get the latest quotation and product catalogue!
