For SiO2 film. Si3N4 film, Mainly used at Optical glass AR film and Low-E glass film series
2£º£¨£ºPhysical and chemical properties of the product£©
( Chemical Composition) £ºSi
£¨Resistivity£©£¨20°C£©£º< 20 ohm. Cm£¨Al=1500ppm£©
£¨Impurites content Max£©£¨Unit£©£ºppm
£º L 4000MM £ºT 9MM
(Customized according to specification/drawing)
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