High purity Metal alloy target NiFe alloy sputtering target for Thin Film Coating with factory price

 

High purity Metal alloy target NiFe alloy sputtering target for Thin Film Coating with factory price

Technology of NiFe alloy sputtering target

Manufacturing processes we use depend on the properties of the target material and its application. Fabrication methods vary from vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed and forged.

Our sputtering targets are available in a comprehensive range of compositions,

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Custom shaped 99.98% purity iridium crucible for laboratory

Iridium Crucible of Description

Application: artificial crystal industry, artificial stones, sapphire crystal growth method Iridium crucible used for growth of refractory oxide crystals, the crucible in 2100 ~ 2200 DEG C thousands of hours of work, is the precious metal ware important materials. The high temperature oxidation resistance and thermoelectric properties of iridium iridium / iridium rhodium thermocouple to measure the temperature as the only precious metal materials up to 2100 degrees Celsius in the air;

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high quality ASTM/ANSI B16.5 titanium alloy flange ASME B16.47 Ti6Al4V ELI socket flange

 

high quality ASTM/ANSI B16.5 titanium alloy flange ASME B16.47 Ti6Al4V ELI socket flang

 

 

 

titanium alloy flange of Product Description

 

Name

Titanium flange

Material Grade

Gr1,Gr2,Gr5,Gr7,Gr12

Certificate

EN10204/3.1

Standard

ANSI/ASME B16.5,DIN,EN1902-1, JIS etc.

Size

1/2''~80''(DN10~3600)

Pressure

ANSI: Class 150-2500 DIN:PN6-PN250

Technique

Forged and CNC Machined

Type

WNRF,SORF,BLIND,SW,PL

Flange surface

FF,RF,TG,RJ etc.

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tungsten alloy radiation shielding pure tungsten price per kg

 

tungsten alloy radiation shielding pure tungsten price per kg

 

Nuclear tungsten alloy radiation shielding of discription:

Tungsten alloy(heavy alloy) is ideal for shielding against X rays and gamma radiation. The very high density of tungsten shielding (more than 60% denser than lead) allows a reduction in the physical size of shielding components, without compromising their rigidity or the effectiveness of the shielding characteristics.

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High Purity Silicon Aluminum Rotary Sputter Target with Alias Si Al Rotating Sputtering Target for large area glass coating

 

 High Purity Silicon Aluminum Rotary Sputter Target with Alias Si Al Rotating Sputtering Target for large area glass coating

 

Silicon Aluminum Rotary Sputter Target of Product Description

Si Sputtering pipe target with low price,welcome OEM&0DM

We offer a wide range of ceramic and metallic sputter targets,in planar and rotatable shape,a complete range of targets.

Our rotatable sputter targets are available in lengths up to 4M.Any shorter tube is available.

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Titanium Aluminum Alloy pvd Targets/Titanium SputteringTargets/TiAl alloy target for coating

 

Titanium Aluminum Alloy pvd Targets/Titanium SputteringTargets/TiAl alloy target for coating

 

 

Products

Titanium target

Material

Titanium(Gr1, Gr2, Gr5, Gr7,GR12)

Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc

Certification   

ISO9001:2008, TUV, EN10204.3.1

Standard

ASTM B381;ASTM F67,ASTM F136

size

Ø30–2000mm, thickness 3.0mm–300mm;

Or according customer’s requirement.

Technique

Forged and CNC Machined

Status

Annealed(M)

 Type

 Sputtering target,

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