99.95% Mo1 Mo2 planar Molybdenum sputtering target with competitive price

Hot sale 99.95% Mo1 Mo2 planar Molybdenum sputtering target with competitive price

· Molybdenum sputtering target of introduction

our company specializes in producing high density, ultra high purity (99.9% to 99.9999%) metal sputtering targets for all applications using both vacuum melt/casting and hot isostatic pressing (HIP) technology. Sputtering targets are available monoblock or bonded with dimensions up to 1500 mm. Research-sized targets are also available, as are custom sizes and alloy compositions.

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