Products
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JINXING METAL offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.
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JINXING METAL offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.
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- high quality 4n price niobium oxide sinter
- low price ASTM B365 UNS R05252 Tantalum rod wire
- high quality 20V 47uF Capacitor SMD Tantalum capacitor Type D
- low price 99.99% purity niobium oxide manufacturer
- 0.5mm tantalum foil for industry use
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- high quality 4n price niobium oxide sinter
- low price ASTM B365 UNS R05252 Tantalum rod wire
- high quality 20V 47uF Capacitor SMD Tantalum capacitor Type D
- low price 99.99% purity niobium oxide manufacturer
- 0.5mm tantalum foil for industry use
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JINXING METAL offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.
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JINXING METAL offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.
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JINXING METAL.'s unique enhanced design sputtering targets are produced for use in the sputtering of precious metals and magnetic materials, thereby increasing target utilization. Through engineering design, the enhanced profile provides utilization factors far in excess of those conventionally found in planar designed targets.By taking the inverse of the erosion profile, thus increasing the target thickness in this area
